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Amorphous carbon (a-C) thin films was deposited using Aerosol-Assisted CVD (AACVD) method and the properties was discussed. Flow rate of the experimental setup was varied (15, 30, 45 and 60 bubbles per minute) in order to optimize the a-C thin film characteristics and the electrical, optical and structural properties were investigated. The electrical properties was characterized by current-voltage...
Nitrogen-doped amorphous carbon thin films have been prepared by thermal chemical vapor deposition (CVD) technique at different temperature. The preparation involved argon, camphor and nitrogen as carrier gas, carbon source and dopant respectively. The effects of nitrogen incorporation in the amorphous carbon thin film on electrical and optical properties was characterized by using Advantest R6243...
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