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Nanosphere lithography (NSL) is a simple, effective, and convenient technique for the fabrication of nanoholes, pillar structures, and nanoparticles. An optimal parameter is required for each procedure to fabricate the desired nanostructure, especially for optoelectronic applications to increase their optoelectronic conversion efficiency or some biomedical detection. We produced arrays of gold (Au)...
Nanosphere lithography has potential in many areas, and there have been many methods that deposit the colloidal suspension onto the substrate. However, it is important and still difficult to control the uniformity of the monolayer on a plane substrate. In this study, we have found a method for a uniform monolayer of polystyrene beads by confining the droplets with microwells. By simply controlling...
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