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Si nanocrystallites thin films on p-type (100) Si substrate have been fabricated by pulsed laser deposition (PLD) using a Nd:YAG laser.After deposition, samples were annealed in several environmental gases at the temperature range from 400 to 800 o C. Strong violet-indigo photoluminescence has been observed at room temperature (RT) from nitrogen ambient-annealed Si nanocrystallites. The variation...
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