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This paper for the first time presents a performance comparison between junction and junctionless thin-film transistors (TFTs) by using TCAD simulations. Note that the DIBL and S.S. of a junctionless TFT (JLTFT) are larger and higher, respectively, than those of its junction TFT (JTFT) counterpart. Although the JLTFT gets a higher current drive based on the same Vov as compared with the JTFT, its...
This study presents a new buried-gate vertical MOSFET (BGVMOS) with suppressed overlap capacitance and improved electrical characteristics due to its modified gate structure. According to the TCAD simulations, our proposed BGVMOS structure can gain reduced parasitic capacitances (27.11% Cgd and 37.53% Cgs at VDs = 1.0 V), improved drain saturation current, and free kink effect, in comparison to a...
A non-classical device structure namely self-aligned quasi-silicon-on-insulator (SOI) metal-oxide semiconductor (MOS) field-effect transistor with pi-shaped semiconductor conductive layer (SA-piFET) is presented, seeking to improve the performance and upgrade the reliability of the SOI-based devices. Designed to equip with a SA single crystal silicon channel layer, plus a natural source/drain (S/D)...
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