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We demonstrate the fabrication of antireflection nanostructures on GaAs using holographic lithography. Measured results of the fabricated nanostructures are in good agreement with the calculated values using a RCWA model, effectively suppressing the surface reflection over visible and near-infrared ranges.
A laterally coupled InGaAsP-InP distributed-feedback (DFB) laser operating around 1.55 mum was fabricated through a novel technique for the formation of metal surface gratings by holographic lithography. The self-aligned Cr DFB gratings were formed on the sidewalls as well as on both sides of the laser ridge by means of angled e-beam evaporation of Ti mask and metal-SiO2 lift-off on the top of ridges...
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