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In this paper, we calculate the surrounding strain effects owing to gate dielectric on the device performance of Si nanowires (NWs) with different axial orientations. Surrounding strain effects from valence band structure to hole transport property of NW FETs are developed. The simulated results show that surrounding strain pushes the valence subbands upward. The upshifting trend of the valence subband...
The strain distribution and strained valence band structure in silicon nanowire with varied thicknesses and deposition temperatures of gate dielectric are discussed in detail in this work. Our calculation indicates that valence subbands are dependent on the structure and process parameters. Strain has little effects in (001) orientation. But in Si (110) nanowire, the valence subbands shift upper and...
For the radial boundary force induced in the process, the strain energy distribution and strain tensor components in Ge (110) nanowire (NW) are calculated by finite element method. Based on the strain distribution, we compute valence band structures with different radial forces. As increasing force values, top valence subbands shift downwards. The influence on the corresponding effective masses and...
We report on a theoretical study of the valence band structures of germanium-silicon core-shell nanowires based on a 6times6 kldrp model. We take into account the inhomogeneous strain effects induced by the lattice mismatches between germanium and silicon. We find that the top subband ends drift back to Gamma point, and the effective masses of more subbands begin to decrease when the shell thickness...
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