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Three-dimensional dynamic random access memory (3D DRAM) using through-silicon via (TSV) has been acknowledged as one good approach for overcoming the memory wall. However, the IO-channel power of a TSV-based 3D DRAM represents a significant portion of the 3D DRAM power. In this paper, we propose a built-in self-test (BIST) -assisted tuning scheme to adjust the driving capability of programmable drivers...
The three-dimensional (3D) integration technology using through silicon via (TSV) provides many benefits over the 2D integration technology. Although many different manufacturing technologies for 3D integrated circuits (ICs) have been presented, some challenges should be overcome before the volume production of 3D ICs. One of the challenges is the testing of 3D ICs. This paper proposes test integration...
In the past few years, we have witnessed the energy crisis and the financial tsunami that played an unwanted duo, changing the world in many aspects that affect most of us. Like many others, the semiconductor industry is trying to recover from the depression triggered by the duo. While companies are working hard in getting out of the slump, many research organizations are rethinking how their R&D...
Three-dimensional (3D) integration using through silicon via (TSV) is an emerging technology for integrated circuit designs. 3D integration technology provides numerous opportunities to designers looking for more cost-effective system chip solutions. In addition to stacking homogeneous memory dies, 3D integration technology supports heterogeneous integration of memories, logic, sensors, etc. It eases...
As we adopt more advanced process technologies, the volume production of memory devices, such as DRAM and Flash, becomes more difficult. It seems inevitable that during the ramp-up period, the initial manufacturing yield will be lower, and it takes more time and effort to improve the yield to a reasonable level. Although redundancy can be used to improve the yield eventually, the reserved spares may...
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