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The resistivity of nano-scaled thin nickel film can be controlled so as to be applicable to MEMS-based micro-bolometric infrared image sensor technology. DC-sputtered 60nm-thick thin nickel film on a SiO 2 /Si substrate was oxidized in O 2 ambient. From XRD and electrical analyses, a phase transformation from the metallic nickel film to crystalline nickel oxide films was verified....
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