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For decreasing thicknesses of wafer based silicon solar cells, photon management structures to maintain high quantum efficiencies will gain importance. Diffractive gratings on the wafer back side can be designed to achieve very high path length enhancements, especially for weakly absorbed infrared radiation. This technologically demanding concept has to be realised using processes with upscaling potential...
We investigated a novel process chain based on Nanoimprint Lithography (NIL) for realising defined textures. As application we chose the honeycomb texturing of multicrystalline silicon (mc-Si), which so far was applied using elaborate photolithographic processing for reaching the highest efficiencies on this type of substrate material up to now.The developed process chain contains the single steps...
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