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Hydrogenated microcrystalline silicon films were deposited by glow discharge decomposition of SiH 4 diluted in mixed gas of Ar and H 2 . By investigating the dependence of the film crystallinity on the flow rates of Ar and H 2 , we showed that the addition of Ar in diluted gas markedly improves the crystallinity due to an enhanced dissociation of SiH 4 . The infrared-absorption...
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