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Crystalline uranium oxide thin films were deposited in an unbalanced magnetron sputtering system by sputtering from a depleted uranium target in an Ar+O 2 mixture using middle frequency pulsed dc magnetron sputtering. The substrate temperature was constantly maintained at 500°C. Different uranium oxide phases (including UO 2−x , UO 2 , U 3 O 7 and U 3 ...
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