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(111)-oriented Mn2N0.86 thin films were fabricated on (001)-oriented MgO substrates by plasma-assisted molecular beam epitaxy. In-situ reflection high-energy electron diffraction and ex-situ X-ray diffraction results demonstrated that the (111)-oriented Mn2N0.86 thin films were single phase. The rocking curve manifested a very good crystallinity of Mn2N0.86 (111) phase and the thickness of the film...
CuO thin film was epitaxially grown on MgO (111) substrate by plasma-assisted molecular beam epitaxy method. Reflection high-energy electron diffraction monitoring and X-ray diffraction analysis indicates it is single crystal CuO (002) thin film. Without any detectable ferromagnetic dopant or second phase, the CuO thin film displays ferromagnetic characteristics at both 5K and 300K. With an in-plane...
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