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The effect of thermal annealing treatments on the morphology and structure of amorphous unalloyed and amorphous Si alloyed alumina thin films has been investigated. All amorphous thin films were deposited by filtered cathodic arc deposition at room temperature onto Si3N4 coated Si substrates and subsequently annealed in argon atmosphere at temperatures in the range of 610°C–1100°C with a heating rate...
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