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We experimentally investigated the device performance of n+- poly-Si/PVD-TiN stacked gate FinFETs with different Hfin's. It was found that mobility enhances in the tall Hfin devices due to the increased tensile stress. However, as Lg decreases, Ion for tall Hfin case becomes worse probably due to high Rsp. It was also confirmed that Vth variation increases with increasing Hfin due to the rough etcing...
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