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In article number 1905000, Jae‐Hyun Lee, Taesung Kim, and co‐workers demonstrate a uniform and stable 1T phase of WS2 (1T‐WS2) film on 4‐inch wafer using a plasma‐enhanced chemical vapor deposition system. The nanocrystalline 1T‐WS2, containing high density of grain boundary, is utilized as an electrocatalyst for the hydrogen evolution reaction and exhibits efficient catalytic activity and high durability...
The metallic 1T phase of WS2 (1T‐WS2), which boosts the charge transfer between the electron source and active edge sites, can be used as an efficient electrocatalyst for the hydrogen evolution reaction (HER). As the semiconductor 2H phase of WS2 (2H‐WS2) is inherently stable, methods for synthesizing 1T‐WS2 are limited and complicated. Herein, a uniform wafer‐scale 1T‐WS2 film is prepared using a...
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