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We have developed a high-frequency noise model for short channel MOSFETs by considering the position dependent surface potential which results in a non-uniform mobility distribution along the channel. The chosen approach successfully reproduces the induced-gate noise and the cross-correlation noise between drain and gate for short channel MOSFETs without additional model parameters. In particular,...
The development trend in compact modeling goes toward surface-potential-based approaches and leads to models like HiSIM2, with higher accuracy, fewer model parameters, and shorter computer runtime than achievable with the conventional threshold-voltage-based approaches. The main motivation for continuing this development effort is to realize a sufficient design capability of RF circuits with advanced...
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