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Microwave plasma generated and sustained by evanescent waves emitted from a parallel-plate type source with a holey top plate was developed as a high-efficiency, lightweight, and low-cost plasma source. The plates dimensions are 100mmx140mm and are separated by 10mm. Five different sizes of holey-plates are compared. In these experiments, the entire body of the parallel plate is placed in a vacuum...
The objective of this study is to model a surface-wave plasma (SWP) source. An additional objective is to use the simulation results to design a high-density and low-pressure operation plasma source. One of the solutions for low-pressure SWP is done in this study by applying a magnetic field. Moreover, a large dielectric disk is used for excitation and control of the surface wave. A precise and fast...
The selective etching of Si by H 2 plasma excited by the ECR technique was investigated. A high etch rate of 20nm/min was obtained for Si and a complete selective etching for SiO 2 was accomplished. Selective Si growth was realized on SiO 2 line and space patterned substrates.
High-density microwave plasma generated and sustained by evanescent waves emitted from a holey-plate has been studied. In this holey-plate (HP) plasma source, microwave power at 2.45GHz supplied from the cavity is converted into an evanescent mode through the use of a holey-plate. Two different geometries of the HP plasma source, a partial-coaxial cavity type and a rectangular waveguide type, have...
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