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Fluidized chemical vapor deposition (FCVD) technology was developed for coating SnO 2 thin film on Al 2 O 3 ultrafine particles. TEM and HREM analysis found that SnO 2 films with different structures were deposited by controlling the coating temperature, reactant concentration, etc. Nanocrystalline SnO 2 film was coated at 573.15 K by gas phase reaction of SnCl...
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