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We report on vertical nanowire FET devices (VNWFETs) with a gate-all-around (GAA) configuration, which offer promising opportunities to enable further CMOS scaling and increased circuit layout efficiency. They allow up to 30% denser SRAM bitcells with improved read and write stability, smaller minimum operating voltages (Vmin), and lower standby leakage values as compared to cells built with lateral...
Phase-change memory devices fabricated using MOCVD-deposited 30% Ge, 20% Sb, and 50% Te atomic composition, GST325 alloy, are fully characterized. In 100-nm-size test devices, a more than 2x reduction of reset current and set resistance were demonstrated compared with equivalent devices using PVD-deposited GST225. The devices show set speeds of 175-260 ns and a ten-year data-retention temperature...
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