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Silicon nanowire waveguides and related etched diffraction grating (EDG) demultiplexers are studied by alpha-Si-on-SiO2 technology. Compact EDG demultiplexers with 10 nm spacing for both echelle and total-internal-reflection (TIR) facets have been fabricated and characterized.
We present fabrication and measurement results of an ultracompact silicon-on-insulator-based echelle-grating triplexer, which uses different diffraction orders to cover a large spectral range from 1.3 mum to 1.5 mum, with a footprint of 150 mum times 200 mum.
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