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Atomic layer etching (ALE) using the environmentally friendly electronic gas fluoromethane (CH3F) is guided for fabricating nanoscale electronic components. The adsorptive purification of CH3F provide a viable direction to remove trace amounts of impurities to produce highly pure CH3F (>99.9999%) for the ALE process. Herein, to remove trace propane (~100 ppm) in CH3F, we report synergetic thermodynamic...