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Niobium oxide thin films were grown by direct liquid injection chemical vapor deposition using Nb(OC 2 H 5 ) 5 precursor. Influence of reactant's molar ratios [oxygen:Nb(OC 2 H 5 ) 5 ] and deposition temperatures on films properties such as growth rate, stoichiometry, crystal structure, morphology, dielectric constant and leakage current were studied...
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