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Epitaxial chromium dioxide (CrO 2 ) thin films have been deposited by low pressure chemical vapor deposition (LPCVD) on (100) TiO 2 substrates using the precursor chromium hexacarbonyl (Cr(CO) 6 ) within a narrow temperature window of 380–400°C. Normal θ–2θ Bragg x-ray diffraction results show that the predominant phase is CrO 2 with only a small amount of Cr 2...
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