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Contact resistance is important to integrated circuits and thin film devices, carbon nanotube based cathodes and interconnects, field emitters, wire-array z-pinches, metal-insulator-vacuum junctions, and high power microwave sources, etc. In other applications, the electrical contacts are formed by thin film structures of a few microns thickness, such as in micro-electromechanical system (MEMS) relays...
Summary form only given. Electrical contact is important to thin film devices and integrated circuits, carbon nanotubes based cathodes and interconnects, field emitters, wire-array Z pinches, metal insulator-vacuum junctions, and high power microwave sources, etc. Because of the surface roughness on a microscopic scale, true contact between two pieces of conductors occurs only at the asperities of...
This paper discusses recent advances on the electrical contact resistance. The basic theory of the contact resistance is vastly extended to higher dimensions, including dissimilar materials in the main current channels and in the connecting bridge joining them. Recent experiments and simulations were also performed to validate our theory.
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