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Amorphous carbon (a-C) films have been produced by unbalanced magnetron sputtering (UBMS) on silicon (Si), aluminium (Al), and chromium (Cr) substrates as a function of substrate bias voltage. The chemical bonding configurations were investigated by Raman and near-edge X-ray absorption fine structure (NEXAFS) spectroscopies. It was found that the structural changes induced by bias voltage are substrate-dependent,...
Nitrogenated tetrahedral amorphous carbon (ta-C:N) films having nitrogen content from 0 to 10.3 at.%, have been produced by a double bend off-plane filtered cathodic vacuum arc system. X-ray photoelectron and Raman spectroscopies have been applied to study the effect of nitrogen in the bonding structure in the films. Deconvolution of the XPS spectra revealed a decrease in the amount of sp 3 ...
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