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To characterize hot-carrier-injection degradation, a typical reaction–diffusion model has been used in low-voltage NMOSFETs with only hot-electron-injection. In this paper, an improved reaction–diffusion model of hole-injection and electron-injection induced interface-state generation, with a lower time exponent, is proposed in high-voltage NMOSFETs. The dynamics of hot-carrier-injection are considered...
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