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Boron doped vanadium thin films were fabricated on the micro-slide glass substrates by spray pyrolysis technique at substrate temperature of 400°C. Initially, 0.1 M vanadium(III) chloride (VCl3) solution was prepared in ethanol: water mixture (1: 4) solvent. To prepare the boron doped vanadium oxide films as the concentrations of 2, 5, 7, 10, 20%, the suitable amount of H3BO3 was added in 0.1 M VCl...
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