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The characteristics and generation mechanism of (Ti,Nb,V)(C,N) precipitates larger than 2 μm in Nb-containing H13 bar steel were studied. The results show that two types of (Ti,Nb,V)(C,N) phases exist—a Ti-V-rich one and an Nb-rich one—in the form of single or complex precipitates. The sizes of the single Ti-V-rich (Ti,Nb,V)(C,N) precipitates are mostly within 5 to 10 μm, whereas the sizes of the...
NanoSQUIDs with Dayem nanobridge weak-link junctions were fabricated on single layer niobium film by focus ion beam(FIB) milling. The dimension of the nanobridge is less than 60 nm and the loop scale is from 400×400 nm to 2.5×20 μm. The working temperature range for this device was researched. The voltage-flux transfer properties were measured at different working temperatures.
Reactive ion etching (RIE) is a common tool in micro- and nano-scale device fabrication. This paper presents experimental results of using the RIE tool to etch different films in Nb/NbxSi1−x/Nb Josephson junction array fabrication process in NIM.
We report in CPEM 2012 our effort towards SNS Josephson junction devices for the quantum voltage standard. A single-junction SNS device, with Nb as the superconductor material (S) and NbxSi1−x alloy as the barrier material (N), is fabricated and tested for the first time by NIM (National Institute of Metrology). A I–V characteristic curve of the junction is measured and the experimental results are...
Both SF6 and CF4 are plasma chemistries that are often used during dry etching in fabricating the niobium Josephson junctions. This paper presents the preliminary experimental results of using these two etches on etching Nb/NbxSi1−x/Nb Josephson junctions in NIM.
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