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The fullerene molecules such as C60 and C70 were incorporated in the commercial positive electron beam resist to investigate the performances for patterning and filling the contact holes at nanometer scale. The sensitivity, process window and contrast of the modified resist were improved, while the toluene dilution degraded the sensitivity. The electron beam dose affected the designed holes dimension,...
Amorphous (ZrO 2 ) x –(SiO 2 ) 1−x and (Al 2 O 3 ) x –(ZrO 2 ) y –(SiO 2 ) 1−x−y composite films were prepared using r.f. unbalanced magnetron sputtering in an atmosphere of argon and oxygen at room temperature. The (ZrO 2 ) x –(SiO 2 ) 1−x and (Al 2 O 3 ) x ...
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