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Thermal annealing and oxidation effects in hydrogenated (a-SiC:H) and nonhydrogenated (a-SiC) amorphous silicon–carbon alloy films deposited by radio-frequency magnetron sputtering have been studied. The a-SiC:H and a-SiC films were thermally treated in dry Ar, wet Ar, and dry O 2 atmospheres at temperatures up to 1150°C. The principal effects of thermal annealing in an inert atmosphere on...
Amorphous hydrogenated carbon-rich silicon–carbon alloy film (a-Si 0.3 C 0.7 :H) was deposited by reactive dc-magnetron sputtering of silicon target in argon–methane gas mixture. As-deposited film exhibits white photoluminescence at room temperature. After the deposition the samples were thermally annealed in dry Ar, wet Ar, or dry O 2 flow at 450°C for 30minutes that resulted...
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