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The etching characteristics and mechanisms of MgO thin films in CF 4 /Ar inductively coupled plasma were investigated. It was found that the changes in gas mixing ratio as well as in gas pressure result in a non-monotonic behavior of the MgO etch rate. Plasma diagnostics by Langmuir probe indicated the noticeable sensitivity of both electron temperature and density to the variations of the...
The investigations of plasma parameters and active particles kinetics in an HCl DC glow discharge system were carried out. The investigation combines plasma diagnostics by electric probes and plasma modeling based on the self-consistent solution of Boltzmann kinetic equation and the balance equation of chemical kinetic for neutral and charged particles. It was shown that the direct electron impact...
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