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Suppressing Cu diffusion along the Cu/Cap interface has proven to be one of the most effective ways to enhance the electromigration (EM) resistance of advanced Cu interconnects. Two methods, depositing a thin layer of CoWP on the Cu surface and doping the Cu seed layer with Mn, are presented in this paper. While each effectively enhanced the EM performance, they behaved somewhat differently in improving...
The fin stabilizer is used to reduce the roll motion of ship at zero speed, which is a new application of fin stabilizer. In order to study the process of lift generation of fin stabilizer at zero speed, the model of lift generation of fin stabilizer with double variable chord wings is built based on biomimetic theory such as Weis-Fogh mechanism by the conformal representation. By the methods of simulation...
The interfacial reaction between OSP, electrolytic Ni/Au, and electroless Ni/Pd/Au surface finish and SnAgCu solder on BGA package were investigated. After multiple reflows, IMC morphology and composition is examined by SEM and EDX. Cu6Sn5 formed between LF35 and OSP finish, and Ag3Sn were found disperse in the solder. Both (Nix,Cu1-x)3Sn4 and (Cux,Ni1-x)6Sn5 were observed on interface of electrolytic...
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