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In article number 1901370, Chao Zhao, Hong Liu, and co‐workers report a simple and versatile approach for the direct patterning of liquid metal on various planar and nonplanar substrates. This is achieved by applying a moving magnetic field to the liquid metal dispersed with magnetic microparticles. This approach is also applicable to supermetallophobic substrates and curved surfaces even in narrow...
Patterning of liquid metal (LM) is usually an integral step toward its practical applications. However, the high surface tension along with surface oxide makes direct patterning of LM very challenging. Existing LM patterning techniques are designed for limited types of planar substrates, which require multiple‐step operation, delicate molds and masks, and expensive equipment. In this work, a simple,...
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