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The goal of this article is to study the etching properties as a function of various adsorbed surfactant thickness in wet anisotropic etching process of TMAH solution. The thickness of preferentially adsorbed surfactant molecules on Si{110} and Si{100} has been evaluated by using spectroscopic ellipsometry (SE). The dependence of the etch rate in TMAH and the surface roughness on the layer thickness...
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