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Quaternary Cr–Si–O–N films were deposited by a hybrid coating system using a Cr cathodic arc target and a Si sputtering target in an Ar/N 2 /O 2 gaseous mixture. The influence of oxygen flux rate on the microstructure and properties of the Cr–Si–O–N films were investigated. The results indicated that the oxygen-free Cr–Si–N film exhibited nanocolumnar microstructure containing CrN...
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