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The friction and tribochemical wear of native oxide (SiOx) layers formed on a silicon surface were investigated with atomic force microscopy using a silica (SiO2) sphere tip in ambient air (50% relative humidity). The native SiOx layer thickness was determined to be ~0.8 nm with auger electron spectroscopy. The oxide-free Si/H terminated silicon surface was also studied as a reference for comparison...
Using an atomic force microscope, the running-in process of a single crystalline silicon wafer coated with native oxide layer (Si-SiOx) against a SiO2 microsphere was investigated under various normal loads and displacement amplitudes in ambient air. As the number of sliding cycles increased, both the friction force Ft of the Si-SiOx/SiO2...
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