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Mesoporous silica films with a thickness of 500–900 nm were synthesized on a titanium substrate by the evaporation-induced self-assembly method (with 900–1200 rpm for 90 s) using cetyltrimethylammonium bromide (CTAB) as structure-directing agent and tetraethyl orthosilicate as the silica source. Prior to coating deposition, the titanium substrate was oxidized to increase the surface roughness up to...
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