The Infona portal uses cookies, i.e. strings of text saved by a browser on the user's device. The portal can access those files and use them to remember the user's data, such as their chosen settings (screen view, interface language, etc.), or their login data. By using the Infona portal the user accepts automatic saving and using this information for portal operation purposes. More information on the subject can be found in the Privacy Policy and Terms of Service. By closing this window the user confirms that they have read the information on cookie usage, and they accept the privacy policy and the way cookies are used by the portal. You can change the cookie settings in your browser.
The ion energy distribution of inductively coupled plasma ion source for focused ion beam application is measured using a four grid retarding field energy analyzer. Without using any Faraday shield, ion energy spread is found to be 50 eV or more. Moreover, the ion energy distribution is found to have double peaks showing that the power coupling to the plasma is not purely inductive, but a strong parasitic...
The optimisation is reported on the design of unbalanced magnetron (UBM) sputtering cathodes. For the study, a planar circular cathode backed by a double-coil electromagnet (compatible for a 100 mm diameter target) was developed. The variation of the structure and strength of the magnetic field in front of the target was investigated for different current combinations in the electromagnetic coils,...
The sputter deposition of YBa 2 Cu 3 O 7-x in a dc-diode was performed in pure oxygen medium and an optical spectroscopic study of the resultant discharge revealed strong emissions from both metal atoms and oxygen ions. Emission intensities were studied in pressure range from 0.5 to 3 mbar, with substrate temperatures from 150 to 850°C. Raising the substrate temperature...
The effects of 100 MeV Oxygen and 200 MeV Silver ions on the structural and transport properties of YBCO thin films are reported. Both normal state and superconducting properties were studied on Laser ablated and high pressure oxygen sputtered films. Precise electrical resistance and critical current measurements near T c were made and the data obtained were analysed in the light of existing...
Triode discharges are widely used in plasma assisted physical vapour deposition techniques to enhance ionisation even under low pressures. In addition to this, the triode discharges enable independent control of substrate bias currents irrespective of bias voltage and pressure, compared to magnetron discharges. One of the problems associated with triode discharge is non-uniform distribution of plasma...
A flat diaphragm type pressure transducer with an anodised insulating layer and thin Pt-film as a strain gauge has been designed and made. The paper gives details of the diaphragm and the information on the anodisation process employed. Sputtering was used for the deposition of the Pt-film strain gauge sensors. Observations on the behaviour of the transducer are presented which include, stability...
YBa 2 Cu 3 O 7-x films have been deposited on (100) MgO substrates by a high pressure oxygen sputtering technique. Optical emission spectroscopic study of the sputter plasma indicates that the sputtered species are atomic in nature. Based on the atomic nature of the sputtered species, a model has been used to estimate the atomic flux of different constituents reaching...
A Facing Target Sputtering (FTS) technique with a configuration consisting of two sets of vertically parallel facing targets and a substrate holder mounted perpendicular to the target planes has been designed and fabricated. This system is capable of producing thin multilayer films as well as alloy films. The discharge characteristics of the FTS system when de power is applied is analysed and the...
A stable digital mixer used in a quartz crystal thickness monitor for monitoring the rate of evaporation and total thickness of films during thin film deposition is reported. The mixer circuit plays a vital role in the crystal monitor. A 'D' flip-flop is used as a mixer. The mixer receives inputs both from the reference oscillator and the monitor oscillator and produces an output which is the difference...
A review of the current status of ion assisted deposition of optical thin films is presented. The different kinds of ion sources and their relative merits and demerits are discussed. This is followed by a discussion of the various theoretical models currently in use to explain ion-surface interactions in such a process and finally the properties of oxide thin films deposited using ion assisted deposition...
The dependence of optical constants, structure and composition of titania thin films on the process parameters has been investigated. Films were deposited using both reactive electron beam evaporation and Ion Assisted Deposition (IAD). It has been observed that the refractive index of IAD films is higher than that for the reactively deposited films, without much difference in the extinction coefficient...
Set the date range to filter the displayed results. You can set a starting date, ending date or both. You can enter the dates manually or choose them from the calendar.