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This paper studies the relation of nanopore diameter to film thickness and FIB action time with focus ion beam (FIB). First, the fabrication process for free-standing silicon nitride (Si3N4) films was introduced and got 300 nm and 200 nm thick film at last. Then, a series of pores with different diameters were milled on films under different FIB action time. Subsequently, the relation was analyzed...
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