The Infona portal uses cookies, i.e. strings of text saved by a browser on the user's device. The portal can access those files and use them to remember the user's data, such as their chosen settings (screen view, interface language, etc.), or their login data. By using the Infona portal the user accepts automatic saving and using this information for portal operation purposes. More information on the subject can be found in the Privacy Policy and Terms of Service. By closing this window the user confirms that they have read the information on cookie usage, and they accept the privacy policy and the way cookies are used by the portal. You can change the cookie settings in your browser.
Detailed microstructural studies were performed on Ni/Si ohmic contacts to silicon carbide in order to investigate the effect of initial Ni:Si ratio in as-deposited structures on the occurrence of characteristic defects in Ni silicide layers, such as voids, layer discontinuities, rough surface or rough interface. The chosen range of investigated Ni:Si ratios corresponded to δ-Ni2Si as a dominant phase...
Trzy próbki węglika krzemu o politypie 4H (4H-SiC) pokryto sekwencją warstw węgiel/nikiel/krzem/nikiel/krzem, a następnie poddano wygrzewaniu w celu wytworzenia kontaktów omowych. Analiza pasm ramanowskich wskazuje na różnice pomiędzy widzianą z obu stron strukturą warstwy węglowej pomimo, że grubość samej warstwy węglowej odpowiada 8 do 10 monowarstwom grafenowym.
Set the date range to filter the displayed results. You can set a starting date, ending date or both. You can enter the dates manually or choose them from the calendar.