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A laser-plasma EUV source is described, which is going to be utilized for characterization of EUV optical components and sensoric devices in the wavelength region from 11 to 13 nm. EUV radiation is generated by focusing a Nd:YAG laser into a double stream gas puff target. By the use of different target gases, broadband as well as narrow-band EUV radiation can be obtained. The emission characteristics...
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