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The fulvenallenyl radical was produced in 6 K neon matrices after mass‐selective deposition of C7H5− and C7H5+ generated from organic precursors in a hot cathode ion source. Absorption bands commencing at λ=401.3 nm were detected as a result of photodetachment of electrons from the deposited C7H5− and also by neutralization of C7H5+ in the matrix. The absorption system is assigned to the 1 2B1←X 2...
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