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The micropattern of SiO 2 film was prepared by the photooxidation of an organosilicon nanocluster which consists of a three-dimensional Si-core and organic groups on the surface. By UV-irradiation in air, the organosilicon nanocluster film became optically transparent in the UV-vis region. As an intermediate during the photobleaching, a silyl silylene was observed by laser flash photolysis...
The laser chemical vapor deposition (CVD) using dichloromethyl phenylsilane as a monomer gave a polysilane film on a substrate. The micropatterns of the polysilane with the resolution of about 300 μm were formed by laser projection CVD through a photomask. The silylene was observed by laser flash photolysis of dichloromethyl phenylsilane as a transient intermediate during the photochemical reaction...
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