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Our goal is to develop a facile process to create patterns of inorganic oxides and metals on a substrate that can act as hard masks. These materials should have high etch contrast (compared to silicon) and so allow high-aspect-ratio, high-fidelity pattern transfer whilst being readily integrable in modern semiconductor fabrication (FAB friendly). Here, we show that ultra-small-dimension hard masks...
Thin films of block copolymers (BCPs) are widely accepted as potentially important materials in a host of technological applications including nanolithography. In order to induce domain separation and form well-defined structural arrangements, many of these are solvent-annealed (i.e. solvent swollen) at moderate temperatures. The use of solvents can be challenging in industry from an environmental...
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