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Self‐assembled thin films of a lamellar forming polystyrene‐block‐poly(d,l)lactide (PS‐b‐PLA) block copolymer (BCP) contain a “reactive” block that can be readily removed to provide a template for substrate pattern formation. Various methods of PLA removal were studied here with a view to develop the system as an on‐chip etch mask for substrate patterning. Solvo‐microwave annealing was used to induce...
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