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With transistor mask costs soaring and the delays associated with full design re-spins escalating, post-mask Engineering Change Orders (ECOs) - design changes after the masks have been prepared - are increasingly carried out by keeping transistor masks intact and revising only the metal masks. In this paper, we propose a novel design flow for achieving technology remapping for post-mask ECOs. In contrast...
We study problems of scheduling jobs on identical parallel machines, in which a due window has to be assigned to each job. If a job is completed within its due window, then it incurs no scheduling cost. Otherwise, it incurs earliness or tardiness cost. Two due window models are considered. In both models, the due window size is a decision variable common for all jobs. In the first model, called a...
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