The Infona portal uses cookies, i.e. strings of text saved by a browser on the user's device. The portal can access those files and use them to remember the user's data, such as their chosen settings (screen view, interface language, etc.), or their login data. By using the Infona portal the user accepts automatic saving and using this information for portal operation purposes. More information on the subject can be found in the Privacy Policy and Terms of Service. By closing this window the user confirms that they have read the information on cookie usage, and they accept the privacy policy and the way cookies are used by the portal. You can change the cookie settings in your browser.
Recent trends in the microelectronics industry are requiring the growth of metallic first row transition metal films by the atomic layer deposition (ALD) method. The ALD growth of noble metal thin films has been well developed in the past ten years, due to the positive electrochemical potentials of these metal ions and attendant ease of reduction to the metallic state. By contrast, the ALD growth...
Set the date range to filter the displayed results. You can set a starting date, ending date or both. You can enter the dates manually or choose them from the calendar.