The Infona portal uses cookies, i.e. strings of text saved by a browser on the user's device. The portal can access those files and use them to remember the user's data, such as their chosen settings (screen view, interface language, etc.), or their login data. By using the Infona portal the user accepts automatic saving and using this information for portal operation purposes. More information on the subject can be found in the Privacy Policy and Terms of Service. By closing this window the user confirms that they have read the information on cookie usage, and they accept the privacy policy and the way cookies are used by the portal. You can change the cookie settings in your browser.
Chemical mechanical planarization (CMP) is currently used in the processing of Cu/Ta interconnect structures. Electrochemical mechanical planarization (ECMP) is an emerging extension of CMP that can potentially allow low down-pressure planarization of newer interconnect structures containing easily breakable porous dielectrics. In both CMP and ECMP of Ta, it is necessary to chemically (or electrochemically)...
Set the date range to filter the displayed results. You can set a starting date, ending date or both. You can enter the dates manually or choose them from the calendar.