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For the first time we report extremely thin SOI (ETSOI) CMOS with 22 nm gate length (LG) and sub-100 nm contacted gate pitch for system-on-chip (SoC) applications. Multi-Vt transistors are demonstrated with competitive drive currents (NFET/PFET) of 1150/1050 µA/µm at Ioff = 100 nA/µm for high performance (HP) and 920/880 µA/µm at Ioff = 1 nA/µm for low power (LP), respectively, at VDD = 1 V. High...
This paper presents for the first time a full 32 nm CMOS technology for high data rate and low operating power applications using a conventional high-k with single metal gate stack. High speed digital transistors are demonstrated 22% delay reduction for ring oscillator (RO) at same power versus previous SiON technology. Significant matching factor (AVT) improvement (AVT~2.8 mV.um) and low 1/f noise...
For the first time, we have demonstrated a 32 nm high-k/metal gate (HK-MG) low power CMOS platform technology with low standby leakage transistors and functional high-density SRAM with a cell size of 0.157 mum2. Record NMOS/PMOS drive currents of 1000/575 muA/mum, respectively, have been achieved at 1 nA/mum off-current and 1.1 V Vdd with a low cost process. With this high performance transistor,...
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