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Self-assembled monolayers (SAMs) were applied to seal defects present in Al2O3 barrier layers fabricated on PEN substrate by plasma enhanced atomic layer deposition (PE-ALD), and the effects of the SAM in enhancing the barrier properties were studied. Pinhole defects of Al2O3 single layers were covered by SAM based on a 1-dodecanethiol (DDT) precursor. To investigate the formation of SAMs on Al2O3...
Aluminum oxide (Al2O3) layers were deposited on various polymeric substrates by a low frequency plasma-enhanced atomic layer deposition (PEALD) process. Polyethylene naphthalate (PEN), polyethylene terephthalate (PET), and polyethersulfone (PES) were tested as substrates for barrier films. Each substrate has its own characteristics to have influences on the Al2O3 layer formation and penetration into...
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